Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.A cross-sectional SEM image of a circuit made in the 120 nm INTEL technology, with six levels of copper interconnects; from [86], with permission. Note the hierarchical wiring: interconnects in the upper layers are thicker in order to reduce theanbsp;...
Title | : | Predictive Simulation of Semiconductor Processing |
Author | : | Jaroslaw Dabrowski, Eicke R. Weber |
Publisher | : | Springer Science & Business Media - 2013-03-09 |
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